Gas Flow Control
Electrogrip provides system and component-level solutions:
Electrostatic chuck controls must be coordinated with gas backfill and wafer lift.
The GC-3 system controller permits an existing system to
- accept a retrofit electrostatic chuck,
- require only one input signal to drive
- a flow controller and gas valves to perform gas backfill and purge,
- turn the DR4/DR5/DR6 grip command on and off,
- drive a motor to raise and lower wafers, and
- run process with the required gas, rf, etc.

Reliable, Wide-Range Gas Flow Control
Electrogrip's GFC-2 flow controller replaces standard MFC's and features:
- wide range from 0.05sccm to 3slm
- gas-independent self-calibration during operation
- negligible zero-level drift;
- autocalibration and accuracy are independent of line fouling, inlet pressure, etc.
- low-flow version controls 0.05sccm through 3sccm He to permit rapid chuck backfill
- and yields fine control at the actual chuck leakage rate, typically 0.05-0.1sccm

