Electrogrip Advanced Electrostatic Gripping Solutions - Electrostatic Chucks, High Voltage Power Supplies, Control Sytems, Vacuum Systems

Lightweighted and low-expansion chucks with 10nm active-area flatness

are required in EUV lithographic tools.

These chucks also have low outgassing and low particle generation.

EUV Rim chuck

The above is a reticle chuck; Electrogrip also provides wafer chucks of similar flatness:

EUV wafer - size chuck

EUV wafer chuck interferogram